ASML is working with some of the world’s biggest chipmakers to modify its latest High NA EUV lithography machines so they can manufacture much larger chips used in AI data centres. 

The Dutch semiconductor equipment maker plans to develop larger masks for its machines, which could eventually allow them to produce chips similar in size to those designed by Nvidia and Google.

ASML’s existing EUV machines can handle chips measuring up to around 800 square millimetres. However, its newer High NA EUV systems can print much finer features but currently use smaller masks, limiting the size of chips that can be manufactured. 

The company wants to overcome this limitation by moving to larger masks and adapting its tools for bigger chip designs. The move is important as AI companies are increasingly developing larger and more powerful processors for data centres. 

These chips pack huge numbers of transistors and are designed to handle demanding workloads such as AI training and inference. ASML expects the larger-mask technology could also improve system productivity by around 40%, making the equipment more useful for high-performance computing applications.

ASML is expected to work closely with major customers as it develops the technology. Intel is already using High NA EUV tools for some production work, while TSMC is expected to begin implementing the technology around 2030. Samsung and SK Hynix are targeting High NA EUV for DRAM production as early as 2028.

The company plans to demonstrate a pilot production line using larger masks by 2031, with the technology expected to be ready for high-volume manufacturing by 2033. This means the commercial impact will take several years, but the development could become important as AI chip sizes and computing requirements continue to increase.

The announcement also highlights ASML’s central role in the global semiconductor industry. Its lithography machines are critical for producing advanced chips, and growing AI infrastructure spending is pushing chipmakers to invest heavily in newer manufacturing technologies.

For ASML, successfully adapting High NA EUV for larger chips could open another major growth opportunity as demand for AI processors continues to rise.

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